Keep critical flow processes on-target and maximize throughput with the GF135 Advanced Diagnostics Pressure Transient Insensitive (PTI) mass flow controller. The world’s first smart mass flow controller is a true game changer: It performs integral rate-of-decay flow measurement without stopping the flow of process gas. It allows semiconductor manufacturers to verify process gas accuracy, check valve leak-by and monitor sensor stability in real time without removing the flow controller from the gas line.","Combined with an all-metal wetted flow path, ultra-fast settling times and industry-leading process gas accuracy, the GF135 PTI MFC has the potential to transform the productivity and throughput rates for a wide range of deposition processes.","Features","Benefits","Applications

特性

• Long-term zero stability of <±0.5% full scale per year
• 超快沉降时间：<300 ms-<400 ms
• 全尺寸流速:3 sccm到5 slm
• Ultra-high purity flow path - 4µ inch Ra surface finish
• 基于衰减率（rod）技术的嵌入式实时流量误差检测与趋势分析
• 通过通过实际气体测试优化的先进气体模型，提高工艺气体的精确度，提高三倍
• 第三代压力瞬变不敏感（PTI）技术
• 高可视性，电子旋转液晶显示屏提供流量，温度，压力和网络地址的本地指示
• DeviceNet™, RS-485 and analog interfaces
• 实时流量误差检测能够更快地调整流量偏差，并支持晶圆产量的提高
• 传感器稳定性跟踪通过支持预测维护来提高系统的正常运行时间
• 通过跟踪阀片泄漏有助于最大限度地减少泄漏
• 增强的工艺气体精度满足10nm工艺气体化学控制的挑战
• 市场领先的流量稳定时间减少了非生产流量稳定步骤，支持先进的3d设备加工
• 增强压力不敏感度，提供卓越的工艺气体控制，以增强蚀刻和沉积控制
• Corrosion-resistant Hastelloy® sensor provides unmatched long-term sensor stability ensuring maximum yield and throughput
• drop-in替代表面安装和vcr mfcs是一个容易升级的关键气体管道的现有系统
• 半导体先进蚀刻工具
• 超快的沉降时间:<300 ms - <400 ms
• 第三代压力瞬态不敏感(pti)技术
• 高可见度，电子可旋转液晶显示，提供流量，温度，压力和网络地址的本地指示
• 通过跟踪阀门泄漏有助于将第一晶片效应降至最低
• 市场领先的流量稳定时间减少了非生产性流量稳定步骤，支持先进的3D设备处理